Nikon i-Line steppers deliver the superior performance and cost advantage you expect from the world’s lithography leader. Our i-Line steppers provide excellent resolution and overlay with optimal cost of ownership.
Nikon has recently announced the NSR-2205iL1 5x reduction i-line stepper, which was developed to manufacture a variety of devices including power and communications semiconductors, and Micro Electro Mechanical Systems (MEMS). The 2205iL1 was developed in direct response to customer demand for these lithography systems that continue to play an essential role in chip manufacturing, and this novel i-line exposure system builds upon decades of Nikon stepper innovations and expertise to deliver excellent affordability and productivity for semiconductor devices, regardless of the wafer substrate material.
Nikon also offers the NSR-SF155 scan-field stepper, which uses the same 4x reduction ratio and exposure field size as our Deep UV scanners. This eliminates traditional overlay matching issues while requiring fewer exposures, making mix and match with DUV systems easy and cost-effective.
Nikon i-Line steppers deliver the superior performance and cost advantage you expect from the world’s lithography leader. Our i-Line steppers provide excellent resolution and overlay with optimal cost of ownership.
Nikon has recently announced the NSR-2205iL1 5x reduction i-line stepper, which was developed to manufacture a variety of devices including power and communications semiconductors, and Micro Electro Mechanical Systems (MEMS). The 2205iL1 was developed in direct response to customer demand for these lithography systems that continue to play an essential role in chip manufacturing, and this novel i-line exposure system builds upon decades of Nikon stepper innovations and expertise to deliver excellent affordability and productivity for semiconductor devices, regardless of the wafer substrate material.
Nikon also offers the NSR-SF155 scan-field stepper, which uses the same 4x reduction ratio and exposure field size as our Deep UV scanners. This eliminates traditional overlay matching issues while requiring fewer exposures, making mix and match with DUV systems easy and cost-effective.
Cost-effective 5x stepper for diverse applications.
Ultra-high throughput stepper incorporating Skyhook Technology.
