Tokyo, Japan — February 18, 2016 — Nikon Corporation introduces the NSR-S631E ArF immersion scanner, ensuring world-class device patterning and optimum fab productivity to fully satisfy real-world 7 nm node requirements. The S631E builds upon industry-leading Streamlign platform technology to further extend crucial 193 nm immersion lithography. Scanner stage and alignment system innovations enable mix-and-match overlay to 2.3 nm and below, while high speed processing and defectivity reduction provide throughput up to 270 wafers per hour (96 exposure shots/wafer) with enhanced yield, to meet chipmakers’ 7 nm node manufacturing requirements.
It is real-world, on-product performance that is vital to semiconductor manufacturers. The S631E incorporates key advancements in lens, autofocus, and alignment technology to deliver unparalleled on-product multiple patterning, while other progressions maximize fab daily output and yield. In addition, the NSR-S631E is compatible with sophisticated computational and on-product learning solutions that further enhance device patterning.
Committed to delivering real-world lithography solutions for customers, Nikon continues to introduce pioneering new scanners and software technology to achieve next-generation manufacturing performance and productivity objectives. “The NSR-S631E leverages crucial elements of our proven immersion scanners, while incorporating pivotal new developments that ensure world-class device patterning and optimum fab productivity. Our customers tell us these are essential factors in supporting their success at the 7 nm node,” stated Hamid Zarringhalam, Executive Vice President of Nikon Precision Inc.
About Nikon
Since 1980, Nikon Corporation has been revolutionizing lithography with innovative products and technologies. The company is a worldwide leader in semiconductor lithography systems for the microelectronics manufacturing industry with more than 8,000 (semiconductor) lithography systems installed worldwide. Nikon offers the most extensive selection of production-class steppers and scanners in the industry. These products serve the semiconductor, flat panel display (FPD) and thin-film magnetic head (TFH) industries. Nikon Precision Inc. provides service, training, applications and technical support, as well as sales and marketing for Nikon lithography systems in North America. For more information about Nikon, access our website at https://www.nikonprecision.com.
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This press release contains forward-looking statements as that term is defined in the Private Securities Reform Act of 1995, which are subject to known and unknown risks and uncertainties that could cause actual results to differ materially from those expressed or implied by such statements. Such statements are subject to risks, uncertainties and changes in condition, particularly those related to industry requirements and other risks. The Company undertakes no obligation to update the information in this press release.
For further information, contact:
Holly Magoon, Senior Marketing Manager
Nikon Precision Inc.
holly.magoon@nikon.com