Tokyo, Japan — February 18, 2016 — Nikon Corporation introduces the NSR-S631E ArF immersion scanner, ensuring world-class device patterning and optimum fab productivity to fully satisfy real-world 7 nm node requirements. The S631E builds upon industry-leading Streamlign platform technology to further extend crucial 193 nm immersion lithography. Scanner stage and alignment system innovations enable mix-and-match overlay to 2.3...