Belmont, Calif., July 8, 2003 -Targeted for mass production of advanced 80 nm devices and development of 65 nm devices, Nikon Corporation has introduced the NSR-S307E. This scanner is the next generation in Nikon’s successful ArF scanner series. The system combines the world’s highest NA (0.85) projection lens with a newly developed, high productivity platform, improving...

Belmont, Calif., July 11, 2003 – Nikon Corporation announced today that it has obtained a significant order for the NPS3301 300 mm CMP system that will be shipped to a leading development facility in Japan. The system, which will enable the customer to focus on advanced 65nm copper/low k interconnect polishing, will ship in July 2003....