June 27, 2001 Nikon Introduces Ultra-High NA ArF Scanner for 100 nm Design Rules. System Achieves New Levels of Throughput and Accuracy Belmont, California, June 27, 2001 -Nikon Precision Inc. (NPI) has announced its fourth-generation lens-based 193 nm scanner designed to meet the stringent manufacturing requirements for 100 nm semiconductor devices. Called the S306C, the new system...