Resolution ≤ 0.350 μm
Introduced in 1999, Nikon NSR-2205i14E2 systems have been widely adopted in manufacturing facilities around the world. The i14E2 supports a maximum NA of 0.63, enabling resolution of 0.350 μm and beyond. This i-line stepper uses MAC1 real time lens control to enhance imaging performance and stability, while two-dimensional multipoint focus and leveling capabilities maximize the usable depth of focus. The i14E2 also supports Resolution Enhancement Technology (RET), as well as off-axis illumination using the SHRINC4 system.
Flexible systems ensure optimal alignment across diverse processes
A selection of alignment systems is available for the i14E2. The FIA system provides improved accuracy over earlier designs through adoption of an alignment autofocus microscope. In addition, i14E2 phase-contrast FIA capabilities accommodate low step-height marks caused by chemical mechanical polish (CMP), while two-dimensional mark measurement capabilities significantly reduce alignment time for faster wafer processing. The i14E2 also supports Laser Step Alignment (LSA) and Laser Interferometric Alignment (LIA).
Overlay accuracy ≤ 40 nm
The i14E2 incorporates a variety of innovations to enhance stepper overlay accuracy. Stepping precision is enhanced with the introduction of an air bearing wafer stage using linear motors, increased structural body rigidity, and minimized air turbulence. Distortion errors are also decreased, and wafer holder materials have been chosen to lessen the effects of wafer expansion due to irradiation. Together these advancements enable the i14E2 to deliver overlay accuracy of 40 nm or better.
Throughput ≥ 103 wafers per hour
In addition to high efficiency SHRINC4 illumination, the i14E2 utilizes a 2.5kW mercury arc lamp to minimize exposure time. This is combined with reduced stepping time due to the air-guided linear motor stage and high response reticle stage, as well as optimized wafer exchange and alignment times, enabling the i14E2 to deliver ≥ 103 (200 mm) wafers per hour. To further enhance fab productivity, the 2205i14E2 runs on the user-friendly MCSV software platform and supports extensive self-measurement capabilities.
Extendable performance with a variety of system enhancements
The i14E2 is compatible with a multitude of functions to further extend stepper performance. Customers may choose to add on a pellicle particle detector, reticle barcode reader, focus drilling (DP) or OverLay EValuation (OLEV) software, as well as an online and inline interfaces. The standard alpha-based controller for the i14E2 can also be upgraded to the Windows-based, Nikon NEST-α system. NEST-α executes all of the functions of the existing MCSV version, but goes a step further by providing e-Diagnostic readiness and remote connectivity through internet access capability, as well as several other new value-added functions.
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NSR-SF155
