• NSR-S620D
• NSR-S610C

In 2006, the NSR-S609B immersion scanner marked the first milestone in fulfillment of the Nikon Immersion Solution. And, we continued on the fast track with the NSR-S610C, with S610C scanners being used successfully in high-volume manufacturing in leading-edge facilities around the world. These systems are processing more than 2300 wafers per day and delivering defectivity levels on par with dry lithography, while achieving overlay and aberration performance that meets all production requirements for 45 nm applications and beyond.

Now, with the NSR-S620D immersion scanner, which supports overlay capabilities down to 2 nm and throughput up to 200 wafers per hour, Nikon is once again enabling the next generation of IC manufacturing. Nikon developed the S620D (NA = 1.35), based on the new Streamlign platform, to not just satisfy the aggressive performance requirements for double patterning (DP) lithography at 32 nm, but to also be extendible to 22 nm applications.