EMLC 2009 January 12 - 15, 2009 Dresden, Germany
LithoVision 2009 February 22, 2009 Civic Auditorium and Tech Museum of Innovation San Jose, CA
Recent News About Patent Litigation Nikon Corporation to Build Two New Buildings for Production of IC Steppers and Scanners Nikon Corporation Receives Intel's Preferred Quality Supplier Award Nikon Announces ArF immersion Scanner for Double Patterning Nikon and KLA-Tencor Announce New Overlay Solution Nikon Announces High Throughput i-Line Stepper Nikon Ships Immersion Scanners to All Major Semiconductor Manufacturing Regions of the World Nikon NSR-S610C to be Used for Production of 43 nm NAND Flash
