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The NSR-S620D
Enabling the Next Generation

The NSR-S620D was designed to meet the stringent overlay, throughput, and availability requirements for 32 nm double patterning, and provide extendibility to 22 nm applications. With the NSR-S620D, Nikon is once again enabling the next generation of IC manufacturing.

Learn More About the NSR-S620D

NSR-S310F
A high productivity ArF scanner for critical 65 nm applications		  
NSR-S210D
A high productivity KrF scanner for subcritical layers		  
NSR-SF155
The most cost-effective solution for subcritical layers

Nikon Receives Intel's Preferred Quality Supplier Award
Nikon Receives Intel's Prestigious Supplier Continuous Quality Improvement Award
Nikon Corporation to Build Two New Buildings for Production of IC Steppers and Scanners
Nikon Corporation Receives Intel's Preferred Quality Supplier Award
Nikon Announces ArF immersion Scanner for Double Patterning
 Nikon and KLA-Tencor Announce New Overlay Solution

 

 
 

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