Learn More About the NSR-S610C and the NSR-S609B
NSR-S310F
A high productivity ArF scanner for critical 65 nm applications
NSR-S210D
A high productivity KrF scanner for sub-critical layers
NSR-SF155
The most cost-effective solution for sub-critical layers
Nikon Corporation to Build Two New Buildings for Production of IC Steppers and Scanners
Nikon Corporation Receives Intel's Preferred Quality Supplier Award
Nikon Announces ArF immersion Scanner for Double Patterning
Nikon and KLA-Tencor Announce New Overlay Solution
Nikon Announces High Throughput i-Line Stepper
Nikon Ships Immersion Scanners to All Major Semiconductor Manufacturing Regions
Nikon NSR-S610C to be Used for Production of 43 nm NAND Flash
Nikon and Synopsys Announce Manufacturing-Aware DFM Solution for 45 nm and Below
Nikon Announces New ArF and KrF Scanners with 20% Higher Productivity
Nikon Ships World’s First 45 nm Production Immersion Scanner